| 摘要 |
PROBLEM TO BE SOLVED: To provide a design support device and a design support method for multilayer substrate, capable of detecting and correcting a portion with high possibility of producing pattern failure from wiring design information of the multilayer substrate, without performing trial production of the multilayer substrate in a multilayer substrate formed by forming a laminate yielded, by laminating in layers a plurality of substrates having a wiring pattern and heating or pressurizing the laminate. SOLUTION: The design support device (1) of a multilayer substrate comprises an input part (2) for acquiring wiring design information of the multilayer substrate; an extractor (12) for extracting a danger region, where pattern failure might happen by heating or pressurizing the laminate from the acquired wiring design information; and an estimator (13) for deciding whether the pattern failure happens on the basis of an amount of displacement, by estimating the amount of displacement from the design position of a wiring pattern caused, by heating or pressurizing the laminate for the wiring pattern involved in the danger portion extracted in the extractor (12), on the basis of the wiring design information. COPYRIGHT: (C)2008,JPO&INPIT |
