SURFACE TREATMENT METHOD, MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE, AND MANUFACTURING METHOD OF CAPACITIVE ELEMENT

摘要

PROBLEM TO BE SOLVED: To provide a method of treatment by which moisture contained in a treated object is efficiently removed and re-adsorption of the moisture is prevented by solving a conventional problem. SOLUTION: The treatment method for treating the treated object containing the moisture has a step of removing the moisture contained in the treated object in an atmosphere containing excited deuterium, deuterated hydrogen, or tritium. COPYRIGHT: (C)2008,JPO&INPIT