发明名称 SINGLE CRYSTAL PULLING DEVICE
摘要 PROBLEM TO BE SOLVED: To provide a single crystal pulling device that can suppress adverse influences of SiO gas generating from a silicon melt on a heat generating part of a heater and can achieve improvement in a life time of the heater and high quality of a single crystal. SOLUTION: The device is equipped with a first gas supply means 13, 14, 17 to supply inert gas G from above a crucible 3, a second gas supply means 15, 16, 17 to supply inert gas G from below a heater 4, and an air discharging means 19 disposed above the heater 4 to discharge the inert gas G through a discharge port 18 to the outside of a furnace 2, wherein the inert gas G supplied by the first gas supply means 13, 14, 17 is introduced from above the crucible 3 into the crucible and discharged through the discharge port 18 above the heater 4, while the inert gas G supplied by the second gas supply means 15, 16, 17 flows upward between the heater 4 and the crucible 3 and discharged through the discharge port 18 above the heater 4. COPYRIGHT: (C)2008,JPO&INPIT
申请公布号 JP2007254165(A) 申请公布日期 2007.10.04
申请号 JP20060076692 申请日期 2006.03.20
申请人 TOSHIBA CERAMICS CO LTD 发明人 HISAICHI TOSHIO
分类号 C30B29/06;C30B15/00 主分类号 C30B29/06
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