| 摘要 |
PROBLEM TO BE SOLVED: To provide a metal mask for sputtering with the grid part used when forming a transparent electro-conductive film formed on a color filter layer sequentially forming colored layers after forming a black matrix on a transparent substrate, wherein a sagging area width of film thickness of an transparent conductive film electrode is made narrower by changing a shape of a grid part of the metal mask for sputtering. SOLUTION: For the metal mask for sputtering used in order to prepare non-deposition area of the transparent electro-conductive film, the side in contact with the transparent substrate and the grid part on the opposite surface side are formed in a protrusive or trapezoidal step form, wherein the side in contact with the transparent substrate is broader and its opposite surface side is narrow slope, and the protrusive or trapezoidal inclination is 30 to 60 degrees, and a resin layer is prepared on the side in contact with the transparent substrate. COPYRIGHT: (C)2008,JPO&INPIT
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