发明名称 Multilayer interconnection substrate and method of manufacturing the same
摘要 A multilayer interconnection substrate is disclosed that includes a multilayer interconnection layer having at least a first interconnection layer and a second interconnection layer stacked with an insulating layer provided therebetween, and a connection via configured to electrically connect the first interconnection layer and the second interconnection layer. The connection via includes an internal conductor and a metal film covering the internal conductor. The internal conductor is an aggregate of metal particles.
申请公布号 US2007232059(A1) 申请公布日期 2007.10.04
申请号 US20060474453 申请日期 2006.06.26
申请人 FUJITSU LIMITED 发明人 ABE TOMOYUKI
分类号 H01L21/4763;H01L23/48 主分类号 H01L21/4763
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