| 摘要 |
A method for forming an isotropic profile of a contact hole is provided to easily obtain a profile of a wine glass by reducing differences of an etch rate between a TEOS(Tetra Ethyl Ortho Silicate) layer and a BPSG(Boron Phosphoroous Silciate Glass) layer using an anisotropic dry etching apparatus. A first photoresist is formed on an oxide layer(21), and then a primary oxide etching process is performed on the oxide layer by using an anisotropic etching apparatus. A second photoresist(13) is formed on the etched oxide layer, and then a secondary oxide etching process is performed on the oxide layer by using the anisotropic etching apparatus. The second photoresist is removed, and then an oxide reflow process is performed on the oxide layer in a furnace.
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