发明名称 Ophthalmic laser irradiation apparatus
摘要 An ophthalmic laser irradiation apparatus for irradiating a laser beam onto a patient's eye capable of preventing a deviation of an irradiation position of the laser beam due to a change in a pupil (iris), and performing laser irradiation within high precision. The apparatus has an irradiation optical system for irradiating the laser beam onto the eye, an illumination unit, including an illumination light source, in which light intensity of visible illumination light onto the eye is adjustable, a detection unit which detects at least one of a pupil area and a pupil diameter of the eye, a setting unit which sets a reference value of at least one of the pupil area and the pupil diameter, and an informing unit which informs at least one of a detection value of the detection unit along with the set reference value and a comparison result thereof.
申请公布号 US7275829(B2) 申请公布日期 2007.10.02
申请号 US20040855422 申请日期 2004.05.28
申请人 NIDEK CO. LTD. 发明人 SUGIURA MOTOHIRO;TANAKA MASAKI
分类号 A61B3/10;A61B18/20;A61F9/007;A61F9/008 主分类号 A61B3/10
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