发明名称 LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
摘要 A lithographic projection system has an illumination system with a polarization member. A plurality of directing elements reflect different sub- beams of an incident beam into adjustable, individually controllable directions. By means of re-directing optics any desired polarized spatial intensity distribution of the beam can be produced in its cross-sectional plane.
申请公布号 SG135130(A1) 申请公布日期 2007.09.28
申请号 SG20070011836 申请日期 2007.02.15
申请人 ASML NETHERLANDS B.V. 发明人 MULDER, HEINE MELLE;EURLINGS, MARKUS FRANCISCUS ANTONIUS
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