发明名称 |
LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD |
摘要 |
A lithographic projection system has an illumination system with a polarization member. A plurality of directing elements reflect different sub- beams of an incident beam into adjustable, individually controllable directions. By means of re-directing optics any desired polarized spatial intensity distribution of the beam can be produced in its cross-sectional plane. |
申请公布号 |
SG135130(A1) |
申请公布日期 |
2007.09.28 |
申请号 |
SG20070011836 |
申请日期 |
2007.02.15 |
申请人 |
ASML NETHERLANDS B.V. |
发明人 |
MULDER, HEINE MELLE;EURLINGS, MARKUS FRANCISCUS ANTONIUS |
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