APPARATUS FOR PLASMA TREATMENT WITH CAPACITIVE COUPLED TYPE PLASMA SOURCE AND VERTICAL DUAL PROCESS CHAMBER,申请号KR20050049640-传众专利搜索

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发明名称	APPARATUS FOR PLASMA TREATMENT WITH CAPACITIVE COUPLED TYPE PLASMA SOURCE AND VERTICAL DUAL PROCESS CHAMBER
摘要
申请公布号	KR100761687(B1)	申请公布日期	2007.09.28
申请号	KR20050049640	申请日期	2005.06.10
申请人		发明人
分类号	H01L21/3065;H01L21/02;H01L21/205	主分类号	H01L21/3065
代理机构		代理人
主权项
地址

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