| 摘要 |
PROBLEM TO BE SOLVED: To provide a composite for chemical mechanical polishing having a high-level polishing rate and capable of solving a metal dishing and residue problem. SOLUTION: The composite for chemical mechanical polishing contains a compound for polishing, corrosion inhibitor, surfactant, diacid compound, metal residue inhibitor, and water. COPYRIGHT: (C)2007,JPO&INPIT |
