| 摘要 |
PROBLEM TO BE SOLVED: To provide a temperature control method of a substrate processor with which an appropriate setting temperature of a heating means, which achieves desired temperature distribution in a processing chamber, can uniquely be decided in short time irrespective of an operator, and to provide a substrate processing system and the substrate processor. SOLUTION: A substrate processing is performed for making respective heaters to the prescribed setting temperature. A physical value which belongs to the substrate on which the substrate processing is performed, and which fluctuates in accordance with a processing temperature is acquired in measuring positions whose number is larger than the number of heaters. A deviation between the acquired physical value and a target value of the physical value is operated at every measuring position. A correction amount of the setting temperatures of the respective heaters is operated by using determinant based on the deviation in the respective measuring positions, and a change amount of the physical value in the respective measuring positions when one heater temperature is changed by 1°C. A subsequent substrate processing is performed by making a temperature obtained by adding a setting temperature correction amount to the prescribed setting temperature as a new setting temperature. COPYRIGHT: (C)2007,JPO&INPIT
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