| 摘要 |
PROBLEM TO BE SOLVED: To provide a method for manufacturing films of wide areas having metal layers patterned in accordance with irregular shapes. SOLUTION: The method of manufacturing the films comprises: forming an irregular shape by a nano imprinting method or a lithography method on a resin film; forming an aluminum film (metal layer) of 100 nm on the irregular shape face by sputtering; forming an SiO<SB>2</SB>(mask layer) film of 5 nm by sputtering; removing a part of the metal layer by wet-etching by solution mainly comprising phosphoric acid or the like; and obtaining the film of the wide areas having the metal layer formed by patterns in accordance with the irregular shapes. The method provides a grid polarizer by coating a protective film on the film. COPYRIGHT: (C)2007,JPO&INPIT
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