发明名称 |
PLASMA PROCESSING APPARATUS, PLASMA PROCESSING METHOD, AND STORAGE MEDIUM |
摘要 |
A plasma processing apparatus that enables polymer to be removed from an electrically insulated electrode. A susceptor of the plasma processing apparatus is disposed in a substrate processing chamber having a processing space therein. A radio frequency power source is connected to the susceptor. An upper electrode plate is electrically insulated from a wall of the substrate processing chamber and from the susceptor. A DC power source is connected to the upper electrode plate. A controller of the plasma processing apparatus determines a value of a negative DC voltage to be applied to the upper electrode plate in accordance with processing conditions for RIE processing to be carried out.
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申请公布号 |
US2007221493(A1) |
申请公布日期 |
2007.09.27 |
申请号 |
US20070689065 |
申请日期 |
2007.03.21 |
申请人 |
TOKYO ELECTRON LIMITED |
发明人 |
HONDA MASANOBU;MATSUI YUTAKA;SATO MANABU |
分类号 |
G06F19/00;C23C14/00;C23C14/32 |
主分类号 |
G06F19/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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