| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a lithographic apparatus which further improves acceleration of a patterning device supporter, and avoids a fine slip between the patterning device supporter and a patterning device supported thereon. <P>SOLUTION: A vacuum pad 5 of a vacuum apparatus 4 is arranged for the upper side of a patterning device 2, and thus, a vacuum force is applied to the upper side of the patterning device 2. A plurality of electrostatic clamping devices 6 are further provided to apply a clamping force to the substantially the same portion of the patterning device 2 as the vacuum device 4. <P>COPYRIGHT: (C)2007,JPO&INPIT |
