| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an exposure apparatus capable of highly efficiently executing multiplex exposure of a substrate. <P>SOLUTION: The exposure apparatus EX has an optical system PL for irradiating a first exposure region AR1 with a first exposure light EL1 from a first pattern PA1 to form an image of a first pattern on the first exposure region, and irradiating a second exposure region AR2 with a second exposure light EL2 from a second pattern PA2 to form an image of a second pattern on the second exposure region; and a light-receiving device 31 for receiving a detected light via at least one part of the optical system. The apparatus is also provided with a detecting system 30 for acquiring information about the positional relation between the image of the first pattern and the substrate and information about the positional relation between the image of the second pattern and the substrate via at least one part of the optical system PL, in parallel with at least one part of an operation performing multiplex exposure for predetermined region on a substrate P with the images of the first pattern and the second pattern. With this configuration, multiplex exposure can be highly efficiently performed for the substrate. <P>COPYRIGHT: (C)2007,JPO&INPIT |
