| 摘要 |
PROBLEM TO BE SOLVED: To provide a visual inspection system for obtaining the image at a preset position, especially the image in the focused state, of a substrate without using a dedicated alignment mechanism or an automatic focusing mechanism. SOLUTION: A stage 2 vacuum-holds a wafer 1. A stage-rotating mechanism 3 rotates the stage 2. The wafer 1 is respectively imaged by a first imaging part 5 through a first observation optical system 4 and by a second imaging part 8 through a second observation optical system 7, and image signals are produced. By an image processing part 101 and a displacement calculation part 102, the displacement of the second observation optical system 7 from the position at which a focus is obtained by the second imaging part 8 is detected. On the basis of this displacement, the relative position of the second observation optical system 7 to the wafer 1 is controlled by a mobile mechanism control part 104 and a second mobile mechanism 9. COPYRIGHT: (C)2007,JPO&INPIT
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