发明名称 |
HAZARDOUS WASTE TREATMENT PROCESS |
摘要 |
A method for treating hazardous waste comprising: providing a plasma reactor, waste to be treated and a glass-forming host slag material; contacting within the plasma reactor the waste and the host slag material; and treating the waste and the host slag material using a plasma treatment to melt the host slag material and incorporate inorganic components of the waste within the host slag material, wherein the plasma is generated using an arc and the arc is passed through the host slag material. |
申请公布号 |
CA2646416(A1) |
申请公布日期 |
2007.09.27 |
申请号 |
CA20072646416 |
申请日期 |
2007.03.20 |
申请人 |
TETRONICS LIMITED |
发明人 |
CHAPMAN, CHRIS;DEEGAN, DAVID;ISMAIL, SAEED |
分类号 |
C03B5/02;B09B3/00;C04B35/653 |
主分类号 |
C03B5/02 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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