| 摘要 |
FIELD: technology for orientation of x-ray emitter relatively to the object. ^ SUBSTANCE: laser localizer additionally comprises optical pattern, consisting of 4 groups of identical transparent and nontransparent bars with width t and height H, bars of each group are turned in pattern plane by 45° relatively to bars of adjacent groups and positioned symmetrically to laser axis, pattern is mounted on laser axis perpendicularly to it, in front of the pattern between it and the first deflector on the laser axis perpendicularly to it a nontransparent screen is mounted for screening laser rays of highest diffraction orders, screen having one central aperture for passage of laser rays of zero diffraction order and eight apertures for passage of laser rays, diffracted into ±1 diffraction order, which are positioned on the screen at certain diameter with 45° interval from each other and spatially combined with position of corresponding diffraction maximums of ±1 order in pattern plane. ^ EFFECT: defined area of the object being x-rayed, simplified procedure for determining center of the zone. ^ 4 dwg |
