发明名称 WIRING STRUCTURE FOR ELECTRODE AND METHOD OF MANUFACTURING SAME
摘要 <p><P>PROBLEM TO BE SOLVED: To provide a wiring structure between electrodes having good wiring circuitry in which wiring connections have been done using a conductive film pattern having little variation in film thickness and no cracks or no high resistance parts. <P>SOLUTION: The wiring structure for an electrode is such that an insulating film 6 partially covers an end of an electrode terminal 4 prepared on a substrate 1 and that of a chip electrode 5 prepared on a semiconductor chip 2, and the substrate 1's surface 1a between the end part of the electrode terminal 4 and that of the chip electrode 5 is covered by the insulating film 6, and the electrode terminal 4 and the chip electrode 5 are wired by conductive film patterns 7 formed on the electrodes 4 and 5 and the insulating film 6. <P>COPYRIGHT: (C)2007,JPO&INPIT</p>
申请公布号 JP2007251084(A) 申请公布日期 2007.09.27
申请号 JP20060076035 申请日期 2006.03.20
申请人 RICOH CO LTD 发明人 KOBAYASHI HIROSHI;SANO TAKESHI;OKURA HIDEAKI
分类号 H01L21/60 主分类号 H01L21/60
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