| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a CMP device having a superior chemical-resisting property, which can facilitate slurry washing. <P>SOLUTION: A CMP device keeps at least one coating target selected from a group, consisting of the surface of a head section and the surface of an arm section for retaining a ground member on a grinding pad, the surface of a slurry supply pipe, and the internal wall of a device body, coated by a fluororesin. <P>COPYRIGHT: (C)2007,JPO&INPIT</p> |
