发明名称 |
Overlay metrology using X-rays |
摘要 |
A method for inspection includes directing a beam of X-rays to impinge upon an area of a sample containing first and second features formed respectively in first and second thin film layers, which are overlaid on a surface of the sample. A pattern of the X-rays diffracted from the first and second features is detected and analyzed in order to assess an alignment of the first and second features.
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申请公布号 |
US2007224518(A1) |
申请公布日期 |
2007.09.27 |
申请号 |
US20060389490 |
申请日期 |
2006.03.27 |
申请人 |
YOKHIN BORIS;MAZOR ISAAC;JAMESON SEAN;DIKOPOLTSEV ALEX |
发明人 |
YOKHIN BORIS;MAZOR ISAAC;JAMESON SEAN;DIKOPOLTSEV ALEX |
分类号 |
G03F1/00 |
主分类号 |
G03F1/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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