| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a technology capable of measuring an image surface position of a projection optical system with high accuracy in the case of two-wavelength exposure. <P>SOLUTION: TTL calibration measurement is implemented in a two-wavelength oscillation state in two-wavelength exposure similarly to the case with single wavelength exposure. When an image surface position is detected in an off-axis image height pattern in an exposure region particularly, the adverse effect of bleeding of an image due to a chromatic difference of magnification is eliminated by using a sagittal direction pattern of the projection optical system to detect the image surface position of the projection optical system. Further, an optimum calibration measurement pattern is selected in each of the single wavelength exposure and the two-wavelength exposure. <P>COPYRIGHT: (C)2007,JPO&INPIT |
