| 摘要 |
<P>PROBLEM TO BE SOLVED: To prevent the deterioration of a resist pattern profile caused by MTT errors of a reticle in a lithography process in manufacturing a semiconductor device, in a method of manufacturing the semiconductor device and an apparatus therefor. <P>SOLUTION: Using a lithography technology, a resist base film containing a material which is exposed to light and produces an acid is formed on a wafer 3 where a pattern is formed. Then, gas or a liquid for controlling the quantity of the acid produced at the time of exposure is sprayed on the resist base film from a nozzle 1, and then a resist film is formed on the resist base film sprayed with the gas or the liquid. <P>COPYRIGHT: (C)2004,JPO |
