| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a conductive layer patterning method capable of preventing residues from being produced. <P>SOLUTION: The present invention comprises: a conductive layer forming process for forming a conductive layer L from a conductive material containing aluminum on a substrate P; a resist film forming process for forming a resist film R from an alkali-resistant material on the conductive layer L formed by the conductive layer forming process; an exposure process for exposing the resist film R formed by the resist film forming process via an exposure mask M; and a developing and etching process for developing the resist film R with an alkaline developer, to which a chelate agent has been added, after the exposure process, and etching the conductive layer L. <P>COPYRIGHT: (C)2007,JPO&INPIT |
