发明名称 SUBSTRATE STAGE DEVICE, EXPOSURE APPARATUS AND METHOD FOR MANUFACTURING DEVICE
摘要 <P>PROBLEM TO BE SOLVED: To provide a substrate stage device that can rapidly and tightly make substrates adhere at accurate positions, without leaving gaps on a substrate holder. <P>SOLUTION: The substrate stage device has a substrate stage that moves a substrate, to a position where a predetermined pattern is to be transferred, wherein the device includes a substrate holder 14 to mount a substrate P and a mount assisting mechanism 15a to 15d to temporarily support at least a part of the outer periphery of the substrate upon mounting the substrate on the substrate holder 14. <P>COPYRIGHT: (C)2007,JPO&INPIT
申请公布号 JP2007233052(A) 申请公布日期 2007.09.13
申请号 JP20060054770 申请日期 2006.03.01
申请人 NIKON CORP 发明人 NAGASHIMA MASAYUKI;KOGURE KIYOSHI;KUDO YOSHIHIKO
分类号 G03F7/20;H01L21/027 主分类号 G03F7/20
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