发明名称 DEFECT OBSERVING METHOD AND APPARATUS
摘要 <p><P>PROBLEM TO BE SOLVED: To provide a method and an apparatus for putting a defect of an observational object in a view of an electron microscope, etc. without failure, and further making a scale of the apparatus small, in the method and the apparatus for observing the defect detected by an optical foreign matter inspection device or an optical visual inspection device with the electron microscope in detail. <P>SOLUTION: The electron microscope 5 for observing the defect detected by an optical defect inspection device is mounted with an optical microscope 6 for re-detecting the defect, and has a constitution where, when focusing of the optical microscope 6 is performed, a lighting position and a detecting position of the optical microscope 6 to a sample 1 are not changed. <P>COPYRIGHT: (C)2007,JPO&INPIT</p>
申请公布号 JP2007235023(A) 申请公布日期 2007.09.13
申请号 JP20060057471 申请日期 2006.03.03
申请人 HITACHI HIGH-TECHNOLOGIES CORP 发明人 NISHIYAMA HIDETOSHI;HONDA TOSHIFUMI;UTO YUKIO
分类号 H01L21/66;G01B11/30;G01B15/08;G01N21/956;G01N23/225 主分类号 H01L21/66
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