发明名称 DEVICE FABRICATION BY INK-JET PRINTING MATERIALS INTO BANK STRUCTURES, AND EMBOSSING TOOL
摘要 A method for manufacturing a device for ink-jet printing materials on a bank structure, and an embossing tool are provided to form a short channel for producing a TFT(Thin Film Transistor) and to make an embossing bank structure with at least two levels of thickness contrast by using the multi-stepped embossing tool. A method for manufacturing an electronic device for ink-jet printing materials on a bank structure comprises a step of embossing the surface of work-pieces(200,202) by using an embossing tool(204) to form a microstructure having at least two levels of thickness contrast on the surface of the work-piece and a step of depositing liquid containing functional materials, on the microstructure. The microstructure has a stepped indentation portion formed on the surface of the work-piece and composed of a bottom surface and a step surface. The step surface gets thinner than the bottom surface on the surface of the work-piece.
申请公布号 KR20070092663(A) 申请公布日期 2007.09.13
申请号 KR20070023417 申请日期 2007.03.09
申请人 SEIKO EPSON CORPORATION 发明人 LI SHUNPU;NEWSOME CHRISTOPHER;RUSSELL DAVID;KUGLER THOMAS
分类号 B41M1/24;B41J2/01;B41M3/06 主分类号 B41M1/24
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