| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a polishing composition capable of reducing surface defects such as scratches or projections in the polishing of a magnetic substrate plate treated with Ni-P plating, especially for finish grinding. <P>SOLUTION: This polishing composition for a Ni-containing substrate plate is provided by containing (A) a copolymer resin capable of coordinating with a metallic ion, a polishing promotor and water. <P>COPYRIGHT: (C)2007,JPO&INPIT</p> |
