发明名称 |
Photosensitive Original Printing Plate for Relief Printing, Method for Producing Relief Printing Plate, and Light-Shielding Ink for Performing the Method |
摘要 |
Provided are an original printing plate for relief printing that solves both the problems of the prior-art negative film or its alternatives, and problems of mask pattern formation directly on the surface of the photosensitive resin layer by an ink composition, as well as a method for forming an relief printing plate using the same. Employing a photosensitive original printing plate for relief printing including a support substrate (A); a photosensitive resin layer (B) provided thereon and having a photosensitivity to light in a predetermined wavelength region; and an ink holding layer (C) provided thereon; wherein the layer (C) is capable of retaining a light-shielding ink, and capable of constituting a light-shielding pattern inside the layer (C), the light-shielding pattern being formed by applying the light-shielding ink to the (C) in accordance with the pattern; and wherein the (C) at the area to which the light-shielding ink is not applied is substantially transparent to the light in the predetermined wavelength region.
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申请公布号 |
US2007212647(A1) |
申请公布日期 |
2007.09.13 |
申请号 |
US20050587506 |
申请日期 |
2005.04.25 |
申请人 |
TAKAGI TOSHIYA;FUJIMOTO TAKASHI;TABE TADAHIKO |
发明人 |
TAKAGI TOSHIYA;FUJIMOTO TAKASHI;TABE TADAHIKO |
分类号 |
B41J2/01;G03F7/00;G03F1/00;G03F7/11 |
主分类号 |
B41J2/01 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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