| 摘要 |
The polarity of etch-resist (133a) spread on the thin film (132a) on substrate (131), is changed by light irradiation such that etch-resist moves into a groove of the soft mold (134). The etch-resist pattern is formed on the thin film by irradiating light on etch-resist in groove (134a). The etch-resist pattern is separated from the soft mold. A thin film pattern is formed by etching the thin film and etch-resist pattern. An independent claim is also included for flat panel display fabrication apparatus. |
