| 摘要 |
A method for forming pattern writing data by using a charged particle beam is provided to reduce the amount of layout data by suppressing the number of cells arranged in layout data. A method for forming pattern writing data includes a process for writing a predetermined pattern from layout data of a circuit by using a charged particle beam in a deflecting state of the charged particle beam. In the method, an input process is performed to input the layout data including a pattern corresponding to a plurality of deflection regions(S102). A generating process is performed to generate a partial pattern to be deflected in a self region in the pattern corresponding to each of the deflection regions on the basis of the inputted layout data(S104-S112). A converting process is performed to convert the layout data including a partial pattern for each of the deflection regions into charged particle beam pattern writing data(S114). |
