发明名称 |
Substrate processing apparatus |
摘要 |
The substrate processing apparatus is provided with a gas-liquid mixing nozzle for generating a process liquid mist by mixing a liquid and a pressurized gas, to discharge the process liquid mist to a substrate at high speeds. The liquid may be remover liquid, intermediate rinse liquid or deionized water. The reaction products which having been generated on the substrate in etching process is removed at high speeds with the flow of the mist, whereby the quality of the process is improved.
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申请公布号 |
US7267130(B2) |
申请公布日期 |
2007.09.11 |
申请号 |
US20040836283 |
申请日期 |
2004.05.03 |
申请人 |
DAINIPPON SCREEN MFG. CO., LTD. |
发明人 |
OKUDA SEIICHIRO;SUGIMOTO HIROAKI;KURODA TAKUYA;SATO MASANOBU;HIRAE SADAO;YASUDA SHUICHI;MORINISHI KENYA;IMAI MASAYOSHI |
分类号 |
B08B3/02;B08B1/04;H01L21/00 |
主分类号 |
B08B3/02 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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