发明名称 LIGHT EMITTING DIODE HAVING IN-RICH INGAN/GAN SUPERLATTICE AND THE FABRICATION METHOD THEREOF
摘要 A light emitting diode having In-rich InGaN/GaN super lattice and its fabricating method are provided to improve a luminous efficiency of the diode by dispersing current flowing through the diode, thereby extending a life span of the diode. A bottom GaN layer(55) is positioned on a substrate(51), and an n-type GaN semiconductor layer is positioned on the bottom GaN layer. A p-type GaN semiconductor layer(61) is positioned on the n-type semiconductor layer, and an active layer(59) is interposed between the n-type semiconductor layer and the p-type semiconductor layer. A InGaN/GaN superlattice layer is interposed between the n-type semiconductor layer and the bottom GaN layer.
申请公布号 KR100757799(B1) 申请公布日期 2007.09.11
申请号 KR20060060813 申请日期 2006.06.30
申请人 SEOUL OPTO DEVICE CO., LTD. 发明人 CHOI, JOO WON;NAM, KI BUM;YOON, EUI JOON
分类号 H01L33/04;H01L33/30 主分类号 H01L33/04
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