| 摘要 |
A coating and developing system includes a resist film forming unit block and antireflection film forming unit blocks stacked in layers to form a resist film and an antireflection film underlying the resist film and an antireflection film overlying the resist film in a small space. The coating and developing system can cope with either of a case where antireflection films are formed and where any antireflection film is not formed. Film forming unit blocks: TCT layer B 3 , a COT layer B 4 and a BCT layer B 5 , and developing unit blocks: DEV layers B 1 and B 2 , are stacked up in layers in a processing block S 2 . The TCT layer B 3 , the COT layer B 4 and the BCT layer B 5 are used selectively where antireflection films are formed and any antireflection film is not formed. The coating and developing system is controlled by a carrying program and software.
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