METHOD OF MAKING SEGMENTED CONTACTS FOR RADIATION DETECTORS USING DIRECT PHOTOLITHOGRAPHY
摘要
A method is provided for fabricating contacts on semiconductor substrates by direct lithography that results in durable adhesion of the electrodes, increased interpixel resistance and the electrodes which act as a blocking contact, thereby providing for improved energy resolution in a resultant radiation detector.
申请公布号
WO2007100538(A2)
申请公布日期
2007.09.07
申请号
WO2007US04319
申请日期
2007.02.21
申请人
REDLEN TECHNOLOGIES;CHEN, HENRY;ROUPASSOV, SERGUEI;AWADALLA, SALAH