| 摘要 |
Disclosed is an antireflective film comprising a conductive layer and a low-refractive index layer arranged on a base. The conductive layer is formed through vapor phase polymerization of a monomer such as pyrrole or thiophene, while the low-refractive index layer is made of a cured product of a curable resin composition containing the following components (A) and (B1). (A) A fluorine-containing polymer having an ethylenically unsaturated group. (B1) Porous silica particles composed of hydrolysis products and/or hydrolysis-condensation products of silicon compounds represented by the formulae (1) and (2) below and having an average particle diameter of 5-50 nm. R1hSiX4-h (1) R2jSiX4-j (2) (In the above formulae, R1 represents an alkyl group having 1-8 carbon atoms; Xs independently represent an alkoxy group having 1-4 carbon atoms or the like; h represents an integer of 0-1; R2 represents an alkenyl group having 2-8 carbon atoms, an acryloxyalkyl group having 4-8 carbon atoms or a methacryloxyalkyl group having 5-8 carbon atoms; and j represents an integer of 1-3.)
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