| 摘要 |
<p>An exposure apparatus (EX) is provided with a projection optical system (PL), which has a first visual field region (FA1) and a second visual field region (FA2) different from the first visual field region (FA1), and projects an image of a pattern (PA) on a first image field region (AR1) and a second image field region (AR2). The image of the pattern (PA) is formed in the first image field region (AR1) by exposure light (EL) through the first visual field region (FA1), and the image of the pattern (PA) is formed in the second image field region (AR2) by the exposure light (EL) through the second visual field region (FA2). A first substrate (P1) is exposed by the image of the pattern (PA) formed in the first image field region (AR1), and a second substrate (P2) is exposed by the image of the pattern (PA) formed in the second visual field region (AR2).</p> |
