发明名称 METHOD FOR MANUFACTURING PATTERNED FILM
摘要 <p><P>PROBLEM TO BE SOLVED: To provide a patterned film with high accuracy by using an aerosol deposition method. <P>SOLUTION: The method includes: steps S11 and S12 of laying a plurality of mask layers on a substrate or on an electrode formed on the substrate, the mask layer including at least one layer of a soft mask layer made of a soft material and at least one layer of a hard mask layer made of a hard material; a step S13 of spraying a powder comprising a brittle material to the mask forming surface of the substrate and allowing the power to collide with the lower layer to deposit to form a brittle material layer; and a step S14 of removing the plurality of mask layers. <P>COPYRIGHT: (C)2007,JPO&INPIT</p>
申请公布号 JP2007225950(A) 申请公布日期 2007.09.06
申请号 JP20060047759 申请日期 2006.02.24
申请人 FUJIFILM CORP 发明人 SASAKI TSUTOMU
分类号 G03F7/26;B81C1/00;H01L41/314;H01L41/331;H01L41/39 主分类号 G03F7/26
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