MANUFACTURING METHOD OF TiO2 SPUTTER COATING FILM

摘要

PROBLEM TO BE SOLVED: To provide a TiO2 sputter coating film-manufacturing method capable of coating a crystalline TiO2film on a surface of a substrate without heating, and depositing a TiO2film containing an anatase phase having the photocatalytic activity higher than that of a rutile phase. SOLUTION: A target is formed of TiO2. When coating a TiO2film on a non-heated substrate by performing the high frequency magnetron sputtering in a mixed gas atmosphere of O2and Ar, the crystalline TiO2film containing the anatase phase is deposited by controlling the concentration of O2in the mixed gas and the total pressure of the mixed gas. COPYRIGHT: (C)2007,JPO&INPIT