发明名称 |
Lithographic apparatus and device manufacturing method |
摘要 |
Provided is a radiation distribution system for distributing the radiation from an illumination system to two or more patterning means, each for patterning beams of radiation, which are subsequently projected onto a substrate.
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申请公布号 |
US2007206172(A1) |
申请公布日期 |
2007.09.06 |
申请号 |
US20070717174 |
申请日期 |
2007.03.13 |
申请人 |
ASML NETHERLANDS B.V. |
发明人 |
GUI CHENG-QUN;BLEEKER ARNO J.;DE JAGER PIETER W.H.;SYTSMA JOOST |
分类号 |
G03B27/72;G03F7/20;H01L21/027 |
主分类号 |
G03B27/72 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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