Process device used in production of integrated circuits comprises process chamber, holder within chamber for holding substrate, radiation source, radiation detector and control and evaluation unit

摘要

A process device (1a) comprises a process chamber (10) with outer walls (30), a holder within the chamber for holding a substrate (18) during the process, a radiation source (36) for producing a light beam (50) emitting in the infrared wavelength region, a radiation detector (38) for detecting light from the radiation source reflected onto a surface (25) of the substrate and a control and evaluation unit (43) connected to the detector and/or radiation source to determine the wavelength of an absorption edge which characteristic for the material on the surface of the substrate and to calculate a temperature of the substrate from the determined wavelength. An independent claim is also included for determining a temperature of a substrate during use of the process device.