发明名称 Wafer treatment, involves coating front side of wafer with layer with separation properties and carrier layer, where carrier layer exhibits electrostatic properties and includes elastomer layer or hard layer of polyimide
摘要 <p>Wafer treatment involves coating a front side of a wafer with a layer with separation properties and a carrier layer, where the carrier layer exhibits electrostatic properties. An elastomer layer (5) and a hard layer of polyimide (6) are provided in the carrier layer, where the elastomer layer and the hard layer are fixed by electrostatic surfaces and/or electrostatic devices. Multiple layers of the carrier layer are supported by a mixture of suitable materials or by the material selection of the electrostatic properties of the carrier layer.</p>
申请公布号 DE102006009353(A1) 申请公布日期 2007.09.06
申请号 DE20061009353 申请日期 2006.03.01
申请人 JAKOB, ANDREAS 发明人 JAKOB, ANDREAS
分类号 H01L21/67;H01L21/302 主分类号 H01L21/67
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