EXPOSURE METHOD, DEVICE MANUFACTURING METHOD, AND SUBSTRATE

摘要

There is provided an exposure method capable of preferably performing exposure while maintaining a liquid at a desired state. According to the exposure method, the liquid (LQ) is arranged on a substrate (P) and an exposure light is applied onto the substrate (P) via the liquid (LQ). The concentration of the eluate in the liquid (LQ) arranged on the substrate (P) is set so as to satisfy the condition Rw-Rp <= 1.0 x 10-3, wherein Rp is a transmittance of the liquid (LQ) containing the eluate leached from the substrate (P) per 1 mm in the optical path direction of the exposure light after the liquid (LQ) is arranged on the substrate (P), and Rw is transmittance of the liquid (LQ) before the eluate is leached.