Plasma generating method, plasma generating apparatus, and plasma processing apparatus

摘要

One or more high-frequency antennas is allocated to and disposed in one cubic space C having a side of 0.4 [m] in a plasma generating chamber 1 or in each of plural cubic spaces C, each having a side of 0.4 [m], adjacent ones of the plural cubic spaces being continuous to each other without forming a gap therebetween. The total length L [m] of the high-frequency antennas in each of the cubic spaces C is set in a range which satisfies relationships of (0.2/P)<L<(0.8/P) with respect to an inductively coupled plasma generation pressure P [Pa] which is set in the plasma generating chamber 1.