发明名称 |
Electroless plating apparatus and plating solution |
摘要 |
An electroless plating apparatus can suppress a change in quality of a plating solution and form a plated film without loss of its properties and reliability. The electroless plating apparatus includes a plating solution circulation system having a plating solution supply pipe for supplying a plating solution in a plating solution reservoir tank to a plating tank and a plating solution recovery pipe for returning the plating solution in the plating tank to the plating solution reservoir tank, and a heat retention section for preventing lowering of the temperature of the plating solution in the entire plating solution circulation system.
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申请公布号 |
US2007193510(A1) |
申请公布日期 |
2007.08.23 |
申请号 |
US20060504081 |
申请日期 |
2006.08.15 |
申请人 |
SAIJO YASUHIKO;KOBA TAKASHI;TSUJINO JUNICHIRO |
发明人 |
SAIJO YASUHIKO;KOBA TAKASHI;TSUJINO JUNICHIRO |
分类号 |
B05C3/00 |
主分类号 |
B05C3/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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