发明名称 Electroless plating apparatus and plating solution
摘要 An electroless plating apparatus can suppress a change in quality of a plating solution and form a plated film without loss of its properties and reliability. The electroless plating apparatus includes a plating solution circulation system having a plating solution supply pipe for supplying a plating solution in a plating solution reservoir tank to a plating tank and a plating solution recovery pipe for returning the plating solution in the plating tank to the plating solution reservoir tank, and a heat retention section for preventing lowering of the temperature of the plating solution in the entire plating solution circulation system.
申请公布号 US2007193510(A1) 申请公布日期 2007.08.23
申请号 US20060504081 申请日期 2006.08.15
申请人 SAIJO YASUHIKO;KOBA TAKASHI;TSUJINO JUNICHIRO 发明人 SAIJO YASUHIKO;KOBA TAKASHI;TSUJINO JUNICHIRO
分类号 B05C3/00 主分类号 B05C3/00
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