Method for coating substrates uses a vaporized material having a relative speed which is zero relative to all points of a vaporizing source during the coating process
摘要
<p>Method for coating substrates (1) uses a vaporized material (3) having a relative speed which is zero relative to all points of a vaporizing source (6) during the coating process. An independent claim is also included for a device for coating substrates.</p>
