发明名称 |
DRY ETCHING METHOD, MICROSTRUCTURE FORMING METHOD, MOLD AND ITS PRODUCTION METHOD |
摘要 |
PROBLEM TO BE SOLVED: To realize a vertical cross-sectional shape or an ordered tapered cross-sectional shape in the case micro-ruggedness is formed on a substance comprising tungsten and carbon by dry etching, and to provide a mold in which the surface of a substance comprising tungsten and carbon is provided with micro-ruggedness with a vertical cross-sectional shape or an ordered tapered cross-sectional shape. SOLUTION: Regarding the dry processing method, an object comprising tungsten and carbon is subjected to etching using plasma generated from a gaseous mixture composed of a gas containing fluorine atoms and a gas having CN bonds and hydrogen atoms. COPYRIGHT: (C)2007,JPO&INPIT |
申请公布号 |
JP2007211322(A) |
申请公布日期 |
2007.08.23 |
申请号 |
JP20060034856 |
申请日期 |
2006.02.13 |
申请人 |
MATSUSHITA ELECTRIC IND CO LTD |
发明人 |
NAKAGAWA HIDEO;SASAKO MASARU;MURAKAMI TOMOYASU |
分类号 |
C23F4/00;G02B6/13 |
主分类号 |
C23F4/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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