发明名称 DRY ETCHING METHOD, MICROSTRUCTURE FORMING METHOD, MOLD AND ITS PRODUCTION METHOD
摘要 PROBLEM TO BE SOLVED: To realize a vertical cross-sectional shape or an ordered tapered cross-sectional shape in the case micro-ruggedness is formed on a substance comprising tungsten and carbon by dry etching, and to provide a mold in which the surface of a substance comprising tungsten and carbon is provided with micro-ruggedness with a vertical cross-sectional shape or an ordered tapered cross-sectional shape. SOLUTION: Regarding the dry processing method, an object comprising tungsten and carbon is subjected to etching using plasma generated from a gaseous mixture composed of a gas containing fluorine atoms and a gas having CN bonds and hydrogen atoms. COPYRIGHT: (C)2007,JPO&INPIT
申请公布号 JP2007211322(A) 申请公布日期 2007.08.23
申请号 JP20060034856 申请日期 2006.02.13
申请人 MATSUSHITA ELECTRIC IND CO LTD 发明人 NAKAGAWA HIDEO;SASAKO MASARU;MURAKAMI TOMOYASU
分类号 C23F4/00;G02B6/13 主分类号 C23F4/00
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