发明名称 Exposure apparatus
摘要 In an exposure apparatus employing an over filled optical system, the light quantity distribution on a scanning plane is kept nearly constant for a plurality of scanning light quantities. It selects the light quantity of the light beam irradiated onto the photosensitive body from a plurality of levels, and sets the light quantity selected. According to the light quantity, it selects one of a plurality of correction current profiles, and supplies a light source (231) with a current based on the correction current profile selected. Since the light quantity of the light beam irradiated onto the photosensitive body is corrected by the correction current, the light quantity of the light beam on the photosensitive body becomes nearly constant in the scanning direction.
申请公布号 EP1821512(A2) 申请公布日期 2007.08.22
申请号 EP20070102388 申请日期 2007.02.14
申请人 CANON KABUSHIKI KAISHA 发明人 TOMIOKA, YASUHIRO
分类号 H04N1/04;H04N1/113 主分类号 H04N1/04
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