| 摘要 |
A manufacturing method of a color filter substrate is provided to reduce the number of manufacturing processes by simultaneously forming an overcoat layer and a column spacer. A black matrix(320) defining a plurality of pixel parts is formed on a base substrate(310). A color filter layer(330) is formed on the base substrate on which the pixel parts are defined. A first photoresist film layer and a second photoresist film layer are sequentially stacked on the base substrate on which the color filter layer is formed. The first and second photoresist film layers are exposed by using an exposure mask. The exposed first and second photoresist film layers are developed, and an overcoat layer(340) of the first photoresist film layer and a column spacer(350) of the second photoresist film layer are formed on the black matrix. |
