APPARATUS FOR CONTROLLING SUBSTRATE PROCESSING APPARATUS AND PROGRAM FOR CONTROLLING SUBSTRATE PROCESSING APPARATUS

摘要

[PROBLEMS] To provide a control apparatus for flexibly controlling a substrate processing apparatus corresponding to product process. [MEANS FOR SOLVING PROBLEMS] Four process recipes (PM1-PM4) are stored in a first storage section (255a), and pre-recipes for high temperature, medium temperature and low temperature are stored in a second storage section (255b) by being associated with each process recipe. A process recipe specifying section (260) corresponds to recipe specification by an operator and specifies a process recipe which corresponds to the specified recipe from the first storage section (255a). A stage temperature acquiring section (265) acquires a stage temperature from the specified process recipe. A pre-recipe selecting section (270) selects one pre-recipe which corresponds to the stage temperature, from among the three kinds of pre-recipes stored in the second storage section (255b). As a result, the substrate processing apparatus (PM: process module) can be maintained in an excellent status according to the selected pre-recipe, prior to forming a film on a wafer (W).